Series SCALO Family Of DC Power Supplies
High power density combined with flexibility make Huettinger’s Series SCALO a very compact 30 kW DC plasma power supply unit. Due to its scalable architecture, up to four modules may be connected in parallel, resulting in a total power output of up to 120 kW. For lower power requirements, a 20 kW module is also available. The SCALO is suitable for a wide spectrum of plasma process applications. Equipped with an arc management system and having very little stored energy, SCALO can be used to deposit thin films with superior characteristics, thus enhancing productivity. A variety of data interfaces allow for both process data acquisition and power supply control. The power supplies provide reliable power for a wide range of applications including a broad spectrum of DC sputtering applications. These include high-power applications such as the deposition of copper and tantalum during semiconductor fabrication, or the deposition of high quality ITO layers on flat-panel display substrates. SCALO provides the process energy required for hard coating processes as well as the deposition of optical and decorative coatings. SCALO features ARCtelligent;™ Huettinger’s intelligent arc management system that is both fast and highly effective. Combined with the benefit of extremely low stored energy, this yields films with superior characteristics while significantly enhancing productivity. Detection settings may be adjusted through any one of a number of data interfaces. ARCtelligent™ advances arc management to high levels of performance. SCALO’s modular design means flexibility in power delivery. Modules may be conveniently combined or disconnected for scaling the power available for individual process requirements. Total power outputs from 20 to 120 kW are obtainable in increments of 20 or 30 kW. All SCALO modules are available in water-cooled and air-cooled versions.
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